About me

Research - Research topics - Publications (Please refer to my Resume) - Equipments and Capabilities (under construction) - Students working with me Research topics Top
1. Smallest laser - Visible photonic crystal slab laser - Collaborated with Prof. Tomo Yoshie at Duke University

2. Smallest disk laser - Submicron disk laser (Whispering Gallery Modes) - Collaborated with Prof. Kerry Vahala at Caltech and Prof. Lan Yang at Washington University at St. Louis

3. Cheapest laser - Polymer based dye laser (mechanically tunable) - Collaborated with Zhenyu Li in Prof. Demetri Psaltis group and Yan Chen in Prof. Axel Scherer group, both at Caltech


4. Label free chemical detection - Metal grating transferred transient grating technique - Collaborated with Prof. Koichi Okamoto at Kyoto University in Japan
Undergrad students have been working with me: Top
Julie Sze summer 2004 (with SURF program) Now Master student @ Cambridge University Tom Sze summer 2004 (with SURF program) Now undergrad student @ Harvard University Xiaoliang Zhu 01/2005-07/2006 (Senior thesis) Now @ Microsoft Jiajing Xu 09/2005-07/2006 (Senior thesis) Now graduate student @ EE at Stanford Victor Liu 07/2006-present (Senior thesis) Graduate student @ EE at Stanford Geng Wang 03/2007-present (Summer student) 3rd year Undergrad at Caltech Jie He 03/2007-present (Summer student) 2nd year Undergrad at Caltech Steve Wang
Equipments in my projects:	Top
1. Leica EBPG 5000+, Electron beam direct writing machine Material types: Non magnetic, vacuum-compatible, (semi-) conducting materials, e.g. ·Silicon wafers ·GaAs wafers ·Hard chrome photo-masks. Maximum pattern size: 127 mm x 127 mm (150 mm x 150 mm optional) Beam energy: 20 keV, 50 keV or 100 keV Spot current: Typically used over the range 100 pA to 200 nA. Typical measured spot size @100KeV: 8nm to 150nm
2. Heidelberg DWL 66, Direct write laser system The DWL66 laser lithography system is a high resolution pattern generator for mask making and direct writing. The system is capable of sub-micron minimum feature sizes and uses an interferometer controlled positioning system with a resolution of 10nm. The DWL66 is an ideal solution for almost any application requiring precise microstructures within photolithography. Resolution: 0.8 micron meter Mask Size: 2 inch, 3 inch, 4 inch or wafer size in this range.
3. Cooled CCD spectrometer system Acton SpectraPro 2300i + Princeton Instrument Spec10 cryogenic cooling 100b CCD arrays 1340 x 100 imaging array 20 x 20 um pixels

Last updated: May 09 2008