Prof. David G. Goodwin

Associate Professor of Mechanical Engineering and Applied Physics

David Goodwin received his B.S. from Harvey Mudd College, M.S. and Ph.D. from Stanford University.

One of my main interests is chemical vapor deposition (CVD), which is an important, widely-used technique to deposit thin films of many different materials. For example, CVD of one or more films is a critical step in the manufacture of many integrated circuit devices and semiconductor lasers. Typically, a CVD process must be able to deposit a high-quality film uniformly over a large substrate. Since the film quality and deposition rate are affected by factors such as substrate temperature, surface preparation, gas-phase chemistry, and gas flow patterns in the reactor, designing and optimizing a new CVD process is challenging, and usually requires a great deal of experimentation.

We are interested in new approaches to CVD process design, exploring how advanced simulation tools may assist in designing reactors which deposit uniform films, incorporate on-line sensors, and are designed to run under closed-loop control for robustness in the presence of disturbances. This approach may eventually be able to radically shorten process development time and allow rapid reconfiguration to deposit new materials. With support from the NSF/DARPA Virtual Integrated Prototyping Initiative for Thin Films, I am currently heading an interdisciplinary team of 10 faculty at 4 universities, together with an industrial partner, studying metalorganic CVD of epitaxial thin films of the superconductor YBCO. We have chosen this system for study, since it contains many features generic to CVD processes, and is also of considerable interest for production of superconducting films for high-performance passive microwave filters.

Another area I have been interested in for some time is CVD of diamond films. Our work has focused on

  • diamond growth mechanisms
  • numerical modeling of diamond CVD
  • development of scaling laws for growth rate and film quality
  • combustion synthesis of diamond
  • in-situ laser diagostics (REMPI and LIF)
  • novel plasma deposition methods.

    The plasma deposition work is on-going; the rest is now largely complete. Togther with Jim Butler at NRL, I have written a book chapter which reviews our present theoretical understanding of diamond CVD. It appears in the Handbook of Industrial Diamonds and Diamond Films, recently published by Marcel Dekker.

    Finally, another area of interest is pulsed laser deposition (PLD) of thin films. Pulsed laser deposition may be used to deposit non-equilibrium thin films with novel properties. Our work focuses on laser-induced fluorescence diagnostics of ablation plumes and numerical simulation of plume evolution, including effects of reactive background gases, interactions between the ablation plume and the substrate. This work is done in close collaboration with the group of Professor Harry Atwater, who are using PLD to grow semiconductor and oxide thin films with novel electronic and optical properties.

    Recent Publications

    N. G. Glumac and D. G. Goodwin, "Diagnostics and Modeling of Strained Fuel-Rich Acetylene / Oxygen Flames Used for Diamond Deposition," Combustion and Flame 105, 321 - 331 (1996).

    H. S. Shin and D. G. Goodwin, "Diamond Growth in Premixed Propylene-Oxygen Flames," Applied Physics Letters 66, 2909 - 2911 (1995).

    S. D. Leifer, D. G. Goodwin, M. S. Anderson, and J. R. Anderson, "Thermal Decomposition of a Fullerene Mix," Physical Review B 51 9973-9978 (1995).

    D. G. Goodwin, D. L. Capewell, and P. H. Paul, "Planar Laser-Induced Fluorescence Diagnostics of Pulsed Laser Ablation of Silicon," in Film Synthesis and Growth Using Energetic Beams, MRS Symp. Proc. 388, 33 - 38 (1995).

    H. S. Shin and D. G. Goodwin, "Deposition of Diamond Coatings on Particles in a Microwave Plasma-Enhanced Fluidized Bed Reactor," Materials Letters 19 (1994) 119-122.

    D.G. Goodwin, "Scaling Laws for Diamond Chemical Vapor Deposition I: Diamond Surface Chemistry; Journal of Applied Physics 74 , 6888 - 6894 (1993).

    D.G. Goodwin, "Scaling Laws for Diamond Chemical Vapor Deposition II: Atomic Hydrogen Transport," Journal of Applied Physics 74 , 6895 - 6906 (1993).

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